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Patent Searching and Data


Title:
COATING METHOD FOR FORMING COATING FILM CONTAINING PHOTOCATALYST
Document Type and Number:
WIPO Patent Application WO/2006/090795
Kind Code:
A1
Abstract:
Conventional techniques have had problems that a coating fluid should be repeatedly applied several times for attaining a desired coating amount, a coating film having a high strength is hence difficult to obtain, and spots, blushing, uncoated areas, or cracks occur depending on the working atmosphere. The coating method employs a coating machine which is equipped with a coating-fluid ejection nozzle having a tip opening diameter of 0.5-3.0 mm and which may be further equipped with a blower for air-curtain generation. In the method, a coating fluid comprising at least one binder ingredient selected among alkoxysilanes, products of the partial hydrolysis/condensation of these, and products of the hydrolysis of these, a photocatalyst, and a solvent and having a viscosity of 0.1-100 mPa·s is applied to a substrate with the coating machine while regulating the ejection pressure for the coating-fluid ejection nozzle to 0.01-0.098 MPa. The coating fluid applied is dried to form on the substrate surface a coating film containing the photocatalyst. Thus, a photocatalytic coating film which is excellent in durability and wearing resistance and is less apt to have spots, blushing, uncoated areas, or cracks can be formed in any working atmosphere.

Inventors:
YAGISAWA KATSUO (JP)
HIROBE YOSHIO (JP)
ISHIBAI YOUICHI (JP)
Application Number:
PCT/JP2006/303312
Publication Date:
August 31, 2006
Filing Date:
February 23, 2006
Export Citation:
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Assignee:
ISHIHARA SANGYO KAISHA (JP)
FUMIN CORP (JP)
YAGISAWA KATSUO (JP)
HIROBE YOSHIO (JP)
ISHIBAI YOUICHI (JP)
International Classes:
B05D1/02; B01J35/02; B05D7/24; C03C17/25
Foreign References:
JP2003206136A2003-07-22
JP2002080751A2002-03-19
JPH08173852A1996-07-09
JP2003064308A2003-03-05
JP2004143453A2004-05-20
JP2000262908A2000-09-26
JP2000290534A2000-10-17
Attorney, Agent or Firm:
Asamura, Kiyoshi (New Ohtemachi Bldg. 2-1 Ohtemachi 2-chom, Chiyoda-ku Tokyo 04, JP)
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