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Title:
COBALT COMPLEX, METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING COBALT-CONTAINING THIN FILM
Document Type and Number:
WIPO Patent Application WO/2020/100765
Kind Code:
A1
Abstract:
Provided is a cobalt complex which is liquid at room temperature and useful for manufacturing a cobalt-containing thin film under conditions without using an oxidizing gas. A cobalt complex represented by formula (1). (L1 and L2 represent a unidentate amide ligand of formula (A), a bidentate amide ligand of formula (B) or a heteroatom-containing ligand of formula (C).) (R1 and R2 represent a C1-C6 alkyl group or a tri(C1-C6 alkyl)silyl group. A wiggly line represents an atomic bonding with a cobalt atom.) (R3 represents a tri(C1-C6 alkyl)silyl group. R4 and R5 represent a C1-C4 alkyl group. X represents a C1-C6 alkylene group.) (R6and R8 represent a C1-C6 alkyl group. R7 represents a hydrogen atom or a C1-C4 alkyl group. Y represents an oxygen atom or NR9. Z represents an oxygen atom or NR10. R9 and R10 independently represent a C1-C6 alkyl group.)

Inventors:
OIKE HIROYUKI (JP)
HAYAKAWA TEPPEI (JP)
YAMAMOTO YUKI (JP)
FURUKAWA TAISHI (JP)
TADA KEN-ICHI (JP)
Application Number:
PCT/JP2019/043979
Publication Date:
May 22, 2020
Filing Date:
November 08, 2019
Export Citation:
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Assignee:
TOSOH CORP (JP)
SAGAMI CHEM RES INST (JP)
International Classes:
C07F19/00; C23C16/18; C07C49/12; C07C251/12; C07F7/10; C07F15/06
Domestic Patent References:
WO2012060428A12012-05-10
WO2014052316A12014-04-03
Foreign References:
JP2017081857A2017-05-18
JPH0314534A1991-01-23
JPH02169547A1990-06-29
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JP2009161513A2009-07-23
JP2017081857A2017-05-18
JP2016222568A2016-12-28
JP2018507255A2018-03-15
JP2018212049A2018-11-12
JP2019022221A2019-02-07
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Attorney, Agent or Firm:
T.S. PARTNERS et al. (JP)
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