Title:
COBALT COMPLEX AND METHOD FOR PRODUCING SAME, AND COBALT-CONTAINING THIN-FILM AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2015/190420
Kind Code:
A1
Abstract:
Provided is a cobalt complex which is useful for producing a cobalt-containing thin-film under conditions which do not use an oxidizing gas. The cobalt complex is represented by general formula (I). (In the formula, RA represents: an acyl group represented by general formula (II) (In the formula, RH represents a hydrogen atom or a C1-6 alkyl group which may be optionally substituted with a fluorine atom.); a 1-trifluoromethyl-1-silyloxyalkyl group represented by general formula (III) (In the formula, RH has the same definition as does the RH in general formula (II), and RI represents a C1-4 alkyl group.); an N-alkyl imidoyl group represented by general formula (IV) (RJ represents a C1-6 alkyl group. RK represents a C1-6 alkyl group which may be substituted with a di (C1-3 alkyl) amino group.); or an alkenyl group represented by general formula (V) (In the formula, RM represents a hydrogen atom or a C1-4 alkyl group. RL represents a C1-4 alkyl group. The wavy line represents an E or a Z geometrical isomer, or a mixture thereof.) m represents 0 or 2. RB and RC represent a hydrogen atom, or represent groups which together form a C1-4 alkylene group. RD, RE, RF and RG each independently represent a hydrogen atom or a C1-4 alkyl group. However, m being 2 means cases when RA represents an acyl group (II), a 1-trifluoromethyl-1-silyloxyalkyl group (III), or an alkenyl group (V) are excluded. In addition, RA being an N-alkyl imidoyl group (IV) means cases when RB and RC are groups which together form a methylene group are excluded.)
More Like This:
Inventors:
OIKE HIROYUKI (JP)
MANIWA ATSUSHI (JP)
FURUKAWA TAISHI (JP)
KAWANO KAZUHISA (JP)
KOISO NAOYUKI (JP)
TADA KEN-ICHI (JP)
MANIWA ATSUSHI (JP)
FURUKAWA TAISHI (JP)
KAWANO KAZUHISA (JP)
KOISO NAOYUKI (JP)
TADA KEN-ICHI (JP)
Application Number:
PCT/JP2015/066412
Publication Date:
December 17, 2015
Filing Date:
June 05, 2015
Export Citation:
Assignee:
TOSOH CORP (JP)
SAGAMI CHEMICAL RES INST (JP)
SAGAMI CHEMICAL RES INST (JP)
International Classes:
C07F17/02; C07F15/06; C07F19/00; C23C16/18; C07C11/12; C07C11/167; C07C11/18; C07C13/23; C07C13/263
Domestic Patent References:
| WO2008111499A1 | 2008-09-18 |
Foreign References:
| JPH09235287A | 1997-09-09 | |||
| JP2010528183A | 2010-08-19 | |||
| JP2002114796A | 2002-04-16 | |||
| JP2003342286A | 2003-12-03 |
Other References:
YAMAZAKI, H. ET AL.: "Cobalt metallocycles: XIII. Preparation and x-ray crystallography of cobaltacyclopentadiene and dinuclear cobalt complexes", JOURNAL OF ORGANOMETALLIC CHEMISTRY, pages 251 - 263, XP055242422
Download PDF: