Title:
COLOR RESIST MASK PLATE AND METHOD FOR USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2017/067024
Kind Code:
A1
Abstract:
A color resist mask plate and method for use thereof. A color resist mask plate (10) comprises an alignment coating mark region (11) and an alignment testing mark region (12); the alignment coating mark region (11) comprises a plurality of alignment coating marks (111) coated with colored-film color resists and arranged at equal intervals; the alignment testing mark region (12) comprises a plurality of alignment testing marks (121) coated with testing color resists and arranged at equal intervals, wherein the alignment testing marks (121) have one-to-one correspondence to the alignment coating marks (111).
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Inventors:
XIONG YUAN (CN)
Application Number:
PCT/CN2015/093977
Publication Date:
April 27, 2017
Filing Date:
November 06, 2015
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
G03F1/38
Foreign References:
| CN103969873A | 2014-08-06 | |||
| CN104808434A | 2015-07-29 | |||
| CN101140424A | 2008-03-12 | |||
| JP2001124922A | 2001-05-11 | |||
| JPH06273947A | 1994-09-30 | |||
| JP2003287873A | 2003-10-10 |
Attorney, Agent or Firm:
ESSEN PATENT&TRADEMARK AGENCY (CN)
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