Digital flexographic printing plates are conventionally imaged in two steps. The first step is to ablate the plate in a pattern that defines a mask on the plate. The mask represents the graphical image that the plate is used to print. This step is typically performed by placing the plate on a rotating cylinder and abating the plate with a linearly movable imaging source controlled to ablate the desired image into the overcoat of the plate. The second step of the process is to expose the thereby masked plate to high intensity light, which results in a plate that is ready for processing. This step is typically performed by placing the masked plate on a flatbed and flooding the plate with high intensity light.

In the conventional two step process, great care must be taken in handling the plate after it has been ablated and before it has been exposed, as the carbon on the plate can be easily scratched or otherwise blemished in away that renders useless the image represented on the plate. Flexographic plates are expensive, and losing plates due to corruption resulting from handling is therefore quite undesirable. In addition, flexographic plates can also be quite large in some applications, requiring a very large flatbed exposure device which can also be quite expensive.

One approach to solving this problem has been to provide an exposing apparatus that is integrated into the ablation system. A light source such as a compact arc lamp is provided that is movable along the cylinder on which the plate is placed, exposing the plate after it is ablated as it rotates on the cylinder. This system has not been successful for a number of reasons,

including the geometry of the light source and its inabilityto provide sufficient powerto effectively expose the plate, the effect of exposure latency when a point on the plate rotates out of the field of illumination of the light source, and others.

There is a need in the artforan effective apparatus and method to expose masked flexographic printing plates without having to handle the plates between the processes of ablation and exposure.

SUMMARY OF THE INVENTION The present invention is an exposure system that at least partially surrounds a photopolymeron a rotating cylinder ablation system. The exposure system linearlyfollows the ablation source and operates to expose the ablated (masked) plate with high intensity illumination to expose all points on the photopolymer. In one embodiment, the exposure system employs at least one plasma capillary light source configured to illuminate the photopolymer with high intensity light.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1A is a perspective diagram, and FIG. 1 B is a side view, of an exposure system according to a first embodiment of the present invention.

FIG. 2 is a perspective diagram illustrating the operation of the exposure system shown in FIGS. 1A and 1 B in conjunction with an ablation system according to the first embodiment of the present invention.

FIG. 3 is a cross-sectional view of the exposure system shown in FIGS. 1A and 1 B, taken along line 3-3 of FIG. 1 B.

FIG. 4 is afrontviewofthe exposure system shown in FIG. 1A, with a portion shown in section.

FIG. 5 is an enlarged view of the portion of FIG. 4 that is shown in section, illustrating the configuration of each of the individual high intensity

light sources provided around the circumference of the body of the exposure system.

FIG. 6 is a perspective diagram of a combined ablation and exposure system according to a second embodiment of the present invention.

FIG. 7 is a side view of the combined ablation and exposure system shown in FIG. 6.

FIG. 8 is a diagram illustrating an exemplary light source assembly for use in the combined ablation and exposure system shown in FIGS. 6 and 7.

DETAILED DESCRIPTION The present invention provides an exposure system that at least partially surrounds a photopolymer such as a flexographic plate in a rotating cylinder ablation system, the exposure system linearlyfollowing the ablation source and operating to expose the ablated (masked) plate with high intensity illumination. The flexographic printing plate may be mounted to a rotating cylinder, or may itself be a cylindrical sleeve type of plate. The invention is described below with respect to two exemplary embodiments.

First Embodiment FIG. 1A is a perspective diagram, and FIG. 1 B is a side view, of exposure system 10 according to a first embodiment of the present invention. Body 12, having a toroidal geometry and being made of a material such as aluminum for example, is provided to surround a rotating cylinder (not shown in FIG. 1, but which fits inside aperture A) on which a flexographic plate is mounted. A plurality of high intensity light sources 14 are provided in body 12, each of which is operable to direct high intensity light inward toward the flexographic plate mounted on the rotating cylinder within aperture A. The entire assembly of body 12 and light sources 14 iswater cooled by chambers (shown in FIG. 3) within body 12. Each light source 14 includes a reflector 16

surrounding a lamp 18, where reflectors 16 are dichroic coated to selectively reflect the light spectrum (ultraviolet light) required to polymerize the flexographic plate. The remaining light emission i s absorbed into the liquid cooled body 12.

FIG. 2 is a perspective diagram illustrating the operation of exposure system 10 in conjunction with an ablation system according to the first embodiment of the present invention. In operation, the entire body 12 of exposure system 10 is linearly moved along the t ength of the flexographic plate being ablated on rotating cylinder 20 (within aperture A (FIG. 1A)), so that body 12 follows ablating engine 22 and serves to expose ablated portions of the plate with high intensity light. Light sources 14 (FIG. 1 A) are configured and arranged so that their high intensity light outputs overlap one another, so that all points of the flexographic plate are continu ously exposed by at least one of light sources 14. This is in contrast to prior single-lamp systems in which any particular pointon the plate is exposed to light in a pulsing pattern, which results in a problem known as latency in which each point is not efficiently exposed due to the low duty cycle of lig ht impinging on the point.

Continuous exposure is considerably more effective in exposing the plate properly than the pulsing exposure achieved by the prior art.

FIG. 3 is a cross-sectional view of exposure system 10 taken along line 3-3 of FIG. 1 B. FIG. 3 illustrates the paths of light rays produced by light sources 14 in the body 12 of exposure system 10, showing howthe light produced by lamps 18 is reflected by parabolic reflectors 16. FIG. 3 also shows the configuration of chambers 23 in body 12, which form a path forthe flow of cooling liquid to cool heat produced by light sources 14. As shown in FIG. 3, there are six light sources 14 around the circumference of body 12 in an exemplary embodiment, although there could be more or fewer in alternative configurations. In addition, an alternative configuration may employ

fewer light sources (as few as one in some embodiments), with the output (s) of the light source (s) being piped or otherwise directed to a plurality of light outputs so that continuous exposure of all points of the flexographic plate is achieved.

FIG. 4 is a front view of the exposure system 10 shown in FIG.

1A, with a portion shown in section, and FIG. 5 is an enlarged view of the portion of FIG. 4 that is shown in section. FIGS. 4 and 5 illustrate the configuration of each of the individual high intensity light sources 14 provided around the circumference of body 12 of exposure system 10. In an exemplary embodiment, light source 14 includes lamp 18 that is a 1000 Watt Mercury plasma capillary lamp, located in parabolic reflector 16 that is coated with a dichroic coating on its inner surface so that actinic (ultraviolet) radiation is reflected and all other (non-useful) radiation is absorbed. In other embodiments, a different element such as Xenon, Lead, or another element capable of producing actinic radiation may be used in addition to or in place of Mercury. Reflector 16 is parabolic in one exemplary configuration, but may have a different geometry selected to control an illumination angle of light directed onto the flexographic plate. The plasma capillary light source is advantageous for several reasons, such as its instant-on capability, its ability to focus light in a short distance, its efficiency, etc.

In some embodiments, it is useful to be able to dynamically control an intensity of the light provided by light sources 14. This control is readily achievable by the plasma capillary lamp described above, simply by connecting control system 24to lamp 18 and operating control system 18 to adjust the light intensity output by lamp 18.

Second Embodiment FIG. 6 is a perspective diagram, and FIG. 7 is a side view, of combined ablation and exposure system 30 according to a second

embodiment of the present invention. Light source housing 32 and abating engine 34 are mounted adjacent to rotatable cylinder 36 on which a flexographic plate is mounted, and are linearly movable along the length of cylinder 36. Light source housing 32 houses high intensity light sources 38A and 38B and their respective reflectors 40A and 40B. Shutter42 is provided for selectively blocking light from exiting light source housing 32.

In operation, abating engine 34 and light source housing 32 are linearly moved together along the length of the flexographic plate mounted on rotatable cylinder 36, while cylinder 36 is rotated. The relative locations of abating engine 34 and light source housing 32 cause each point on the flexographic plate to first be ablated by abating engine 34, and then exposed by high intensity light generated by light sources 38A and 38B and reflected onto the flexographic plate by reflectors 40A and 40B. In an exemplary embodiment, light sources 38A and 38B are 5000 Watt Mercury (or another suitable element) plasma capillary light sources as described above with respect to the first embodiment, and light source housing 32 is provided with liquid cooling to carry away excess heat produced by the light sources. From the perspective of a particular point on the flexographic plate, high intensity light is provided from high intensity light sources 38A and 38B in a relatively large area during rotation of cylinder36, due to the provision of multiple light sources and the size of the illumination region of each of light sources 38A and 38B as reflected by reflectors 40A and 40B. The large exposure area is important to avoid the problems of latency and excessive power density that were experienced by priorsystems, and typically an exposure area of greater than about 100 square centimeters is desirable. Light sources 38A and 38B are also located a very short distance, such as about 25-37 millimeters (mm) (and no greater than about 50 mm) in an exemplary embodiment, from rotatable cylinder 36 (and the flexographic plate mounted thereon), due to the

geometryofthe plasma capillary lightsourcesthatare employed. The use of plasma capillary light sources allows a high amount of power of actinic radiation (such as about 700 Watts in one exemplary embodiment) to be delivered to a large area (such as about 230 square centimeters in one exemplary embodiment). This combination provides the high power needed to quickly and effectively expose the photopolymer, so that productivity rates achievable by the system are high, while limiting the power density to about 3 Watts per square centimeter or less so that the photopolymer is not damaged by excessive power. In addition, the problems of latency experienced by prior art systems that exposed points on a flexographic plate with a low duty cycle pulsing light pattern are avoided as well.

FIG. 8 is a diagram illustrating light source housing 32 and the light source components used in the combined ablation and exposure system shown in FIGS. 6 and 7. High intensity light sources 38A and 38B are plasma capillary light sources that emit light in an essentiallyomnidirectional manner.

The light emitted by high intensity light sources 38A and 38B is reflected by reflectors 40A and 40B out of output apertures 42A and 42B (which may include a protective window of some kind). In an exemplary embodiment, reflectors 40A and 40B are coated with a dichroic coating, so that only useful, actinic (ultraviolet) radiation is reflected. Reflectors 40A and 40B are configured in an approximately elliptical shape, but have discrete straight portions ratherthan a continuously curved shape, in orderto provide discrete illumination angles forthe most effective exposure of the flexographic plate.

In some embodiments, it is useful to be able to dynamically control an intensity of the light provided by light sources 38A and 38B. This control is readily achievable by the plasma capillary lamp described above, simply by connecting control system 44 to light sources 38A and 38B and

operating control system 44 to adjust the light intensity output by light sources 38A and 38B.

The present invention provides an exposure system that is usable in combination with an ablation system to expose an abated, rotating flexographic photopolymer plate. The exposure system has light output provided by one or more plasma capillary light sources. This system provides a high degree of efficiency in its abilityto ablate and expose a photopolymer in an integrated process, and also provides very effective exposure by ensuring that the plate is exposed with high intensity light in a field broad enough to avoid the effects of latency and excessive power density, as opposed to exposure that occurs in a low duty cycle pulsing pattern or smaller exposure areas.

Although the present invention has been described with reference to preferred embodiments, workers skilled in the art will recognize that changes may be made in form and detail without departing from the spirit and scope of the invention.