COMPONENTS AND PROCESSES FOR MANAGING PLASMA PROCESS BYPRODUCT MATERIALS

Title:

COMPONENTS AND PROCESSES FOR MANAGING PLASMA PROCESS BYPRODUCT MATERIALS

Document Type and Number:

WIPO Patent Application WO/2019/136396

Kind Code:

A3

Abstract:

Components and processes are disclosed herein for managing non-volatile and/or low- volatility byproduct materials that are generated within a plasma processing region of a plasma processing chamber during performance of various plasma-based processes on a substrate. The components include a top window structure, a liner structure, an edge ring structure, a focus ring structure, a ground ring structure, a substrate access port shield, an insert liner for a port opening in a chamber wall, and an exhaust baffle assembly for positioning within an exhaust channel connected to the chamber. One or more process-exposed surface(s) of the various components are subjected to a surface roughening/texturizing process to impart a surface roughness and/or engineered topography to the process-exposed surface that promotes adhesion and retention of plasma process byproduct materials. The various components with roughened/texturized process-exposed surface(s) are configured for use in lead zirconate titanate (PZT) film etching and/or platinum (Pt) film etching processes.

Inventors:

PENG GORDON (US)
CHHATRE AMBARISH (RISH) (US)
MAROHI DAN (US)
PANDHUMSOPORN TAMARAK (US)
CHAZARO IGNACIO (NACHO) (US)

Application Number:

PCT/US2019/012570

Publication Date:

September 19, 2019

Filing Date:

January 07, 2019

Export Citation:

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Assignee:

LAM RES CORP (US)

International Classes:

H01J37/32; C23C16/44

Foreign References:

US20090261065A1	2009-10-22
US20090123735A1	2009-05-14
US20010053410A1	2001-12-20
US6623595B1	2003-09-23
US20060086458A1	2006-04-27

Other References: