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Patent Searching and Data


Title:
COMPOSITION FOR ANTIREFLECTION COATING AND METHOD FOR FORMING PATTERN USING SAME
Document Type and Number:
WIPO Patent Application WO/2006/003958
Kind Code:
A1
Abstract:
Disclosed is a composition for antireflection coatings which has especially excellent application characteristics while maintaining performance as an antireflective film. Also disclosed is a method for forming a pattern using such a composition. Specifically disclosed is a composition for antireflection coatings which contains at least the following components (A), (B), (C), (D) and (E). (A) A perfluoroalkyl alkylenesulfonic acid represented by the following general formula (1): CnF2n+1(CH2CH2)mSO3H (In this formula, n represents an integer of 1-20 and m represents an integer of 0-20.) (B) An organic amine (C) A water-soluble polymer (D) A perfluoroalkylethyl group-containing compound represented by the following general formula (2): CkF2k+1CH2CH2-X-Y (In this formula, k represents an integer of 1-20; X represents a single bond or a divalent linking group; and Y represents an anionic group or a nonionic group. In addition, this compound has a structure different from that of the component (A).) (E) Water

Inventors:
MATSUO JIROU (JP)
TAKANO KIYOFUMI (JP)
TAKANO YUSUKE (JP)
AKIYAMA YASUSHI (JP)
Application Number:
PCT/JP2005/012001
Publication Date:
January 12, 2006
Filing Date:
June 29, 2005
Export Citation:
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Assignee:
DAINIPPON INK & CHEMICALS (JP)
AZ ELECTRONIC MATERIALS JAPAN (JP)
MATSUO JIROU (JP)
TAKANO KIYOFUMI (JP)
TAKANO YUSUKE (JP)
AKIYAMA YASUSHI (JP)
International Classes:
G03F7/11; H01L21/027; (IPC1-7): G03F7/11; H01L21/027
Foreign References:
JPH11349857A1999-12-21
JPH08305024A1996-11-22
JPH08320569A1996-12-03
JPH09291228A1997-11-11
JPH08305032A1996-11-22
JPH08292562A1996-11-05
JPH103001A1998-01-06
JP2004083412A2004-03-18
JP2004349857A2004-12-09
JPH103001A1998-01-06
EP1026208A12000-08-09
Other References:
See also references of EP 1775633A4
Attorney, Agent or Firm:
Shiga, Masatake (Yaesu Chuo-k, Tokyo, JP)
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