Title:
COMPOSITION FOR ANTIREFLECTION COATING AND METHOD FOR FORMING PATTERN USING SAME
Document Type and Number:
WIPO Patent Application WO/2006/003958
Kind Code:
A1
Abstract:
Disclosed is a composition for antireflection coatings which has especially excellent application characteristics while maintaining performance as an antireflective film. Also disclosed is a method for forming a pattern using such a composition. Specifically disclosed is a composition for antireflection coatings which contains at least the following components (A), (B), (C), (D) and (E). (A) A perfluoroalkyl alkylenesulfonic acid represented by the following general formula (1): CnF2n+1(CH2CH2)mSO3H (In this formula, n represents an integer of 1-20 and m represents an integer of 0-20.) (B) An organic amine (C) A water-soluble polymer (D) A perfluoroalkylethyl group-containing compound represented by the following general formula (2): CkF2k+1CH2CH2-X-Y (In this formula, k represents an integer of 1-20; X represents a single bond or a divalent linking group; and Y represents an anionic group or a nonionic group. In addition, this compound has a structure different from that of the component (A).) (E) Water
Inventors:
MATSUO JIROU (JP)
TAKANO KIYOFUMI (JP)
TAKANO YUSUKE (JP)
AKIYAMA YASUSHI (JP)
TAKANO KIYOFUMI (JP)
TAKANO YUSUKE (JP)
AKIYAMA YASUSHI (JP)
Application Number:
PCT/JP2005/012001
Publication Date:
January 12, 2006
Filing Date:
June 29, 2005
Export Citation:
Assignee:
DAINIPPON INK & CHEMICALS (JP)
AZ ELECTRONIC MATERIALS JAPAN (JP)
MATSUO JIROU (JP)
TAKANO KIYOFUMI (JP)
TAKANO YUSUKE (JP)
AKIYAMA YASUSHI (JP)
AZ ELECTRONIC MATERIALS JAPAN (JP)
MATSUO JIROU (JP)
TAKANO KIYOFUMI (JP)
TAKANO YUSUKE (JP)
AKIYAMA YASUSHI (JP)
International Classes:
G03F7/11; H01L21/027; (IPC1-7): G03F7/11; H01L21/027
Foreign References:
JPH11349857A | 1999-12-21 | |||
JPH08305024A | 1996-11-22 | |||
JPH08320569A | 1996-12-03 | |||
JPH09291228A | 1997-11-11 | |||
JPH08305032A | 1996-11-22 | |||
JPH08292562A | 1996-11-05 | |||
JPH103001A | 1998-01-06 | |||
JP2004083412A | 2004-03-18 | |||
JP2004349857A | 2004-12-09 | |||
JPH103001A | 1998-01-06 | |||
EP1026208A1 | 2000-08-09 |
Other References:
See also references of EP 1775633A4
Attorney, Agent or Firm:
Shiga, Masatake (Yaesu Chuo-k, Tokyo, JP)
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