Title:
COMPOSITION AND COMPOUND
Document Type and Number:
WIPO Patent Application WO/2021/251433
Kind Code:
A1
Abstract:
The present disclosure provides: a composition which contains a compound represented by general formula (1) and a polymer compound, wherein the content of chloride ions relative to the total mass of the composition is less than 1.5 ppm; and a compound. In general formula (1), Het1 represents a five-membered or six-membered divalent aromatic heterocyclic residue; each of Xa, Xb, Xc and Xd independently represents a heteroatom; each of Ya, Yb, Yc, Yd, Ye and Yf independently represents a heteroatom or a carbon atom; and each of two six-membered rings bonded to Het1 may independently have a double bond.
Inventors:
AMASAKI ICHIRO (JP)
KIMURA KEIZO (JP)
SASAKI DAISUKE (JP)
TANI YUKIO (JP)
KIMURA KEIZO (JP)
SASAKI DAISUKE (JP)
TANI YUKIO (JP)
Application Number:
PCT/JP2021/021938
Publication Date:
December 16, 2021
Filing Date:
June 09, 2021
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C07D409/14; C07D413/14; C08K5/45; C08L101/00; G02B1/04; G02C7/00
Domestic Patent References:
| WO2018180929A1 | 2018-10-04 |
Foreign References:
| JP2008273927A | 2008-11-13 | |||
| JP2010083980A | 2010-04-15 | |||
| JP2008274246A | 2008-11-13 | |||
| JP5236297B2 | 2013-07-17 | |||
| JP2018180929A | 2018-11-15 | |||
| JP2010132846A | 2010-06-17 | |||
| JP2020101102A | 2020-07-02 |
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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