Title:
COMPOSITION, CURED FILM, COLOR FILTER, LIGHT BLOCKING FILM, OPTICAL ELEMENT, SOLID-STATE IMAGING ELEMENT, HEADLIGHT UNIT, MODIFIED SILICA PARTICLES, AND METHOD FOR PRODUCING MODIFIED SILICA PARTICLES
Document Type and Number:
WIPO Patent Application WO/2020/203063
Kind Code:
A1
Abstract:
The present invention provides a composition which has excellent development residue suppression properties. The present invention also provides a cured film, a color filter, a light blocking film, an optical element, a solid-state imaging element, a headlight unit, modified silica particles, and a method for producing modified silica particles. A composition according to the present invention contains modified silica particles and a polymerizable compound, and is configured such that: each one of the modified silica particles comprises a silica particle and a cover layer that covers the silica particle; and the cover layer contains a polymer that comprises a repeating unit represented by general formula (1).
Inventors:
KATO RYOSUKE (JP)
Application Number:
PCT/JP2020/009927
Publication Date:
October 08, 2020
Filing Date:
March 09, 2020
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C08F2/44; C01B33/18; C08F20/10; C09C1/30; C09C3/10; C09D4/00; C09D7/61; C09D7/62; G02B5/20; H01L27/146
Domestic Patent References:
| WO2017056911A1 | 2017-04-06 | |||
| WO2020066420A1 | 2020-04-02 |
Foreign References:
| JP2008162069A | 2008-07-17 | |||
| JP2007334265A | 2007-12-27 | |||
| JP2006160802A | 2006-06-22 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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