Title:
COMPOSITION FOR FORMING ANTI-REFLECTION FILM ON RESIST AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/1993/024860
Kind Code:
A1
Abstract:
The title composition is an aqueous solution of a fluoric compound. The method comprises the steps of coating a photoresist composition on a substrate; coating the anti-reflection film composition; exposing the coated film to form a pattern; and developing the photoresist. Since the composition in the form of an aqueous solution is coated on the photoresist, not only the anti-reflection film can be formed easily, but also, the film can be removed easily by rinsing or alkali development. Therefore, by this pattern formation method, it is possible to form a pattern easily with a high dimensional accuracy.
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Inventors:
NISHI MINEO (JP)
MAKISHIMA HIDEO (JP)
MAKISHIMA HIDEO (JP)
Application Number:
PCT/JP1993/000711
Publication Date:
December 09, 1993
Filing Date:
May 27, 1993
Export Citation:
Assignee:
MITSUBISHI CHEM IND (JP)
NISHI MINEO (JP)
MAKISHIMA HIDEO (JP)
NISHI MINEO (JP)
MAKISHIMA HIDEO (JP)
International Classes:
G03F7/09; G03F7/20; (IPC1-7): G03F7/11; G03F7/26
Foreign References:
| JPS6262520A | 1987-03-19 | |||
| JPS6242160A | 1987-02-24 | |||
| JPS54114977A | 1979-09-07 |
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