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Title:
COMPOSITION FOR FORMING FILM, AND FILM FORMED THEREFROM
Document Type and Number:
WIPO Patent Application WO/2023/038488
Kind Code:
A1
Abstract:
The present invention relates to a composition for forming a film, and to a film formed therefrom. The composition for forming a film of the present invention comprises a thermal acid generator or a thermal base generator, and a siloxane resin including a specific structure, and thus, it is possible to manufacture a film having further improved physical properties.

Inventors:
YU SUN (KR)
OH HYUN JOO (KR)
Application Number:
PCT/KR2022/013594
Publication Date:
March 16, 2023
Filing Date:
September 13, 2022
Export Citation:
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Assignee:
HERACHEM TECH CO LTD (KR)
International Classes:
C09D7/63; C09D5/18; C09D183/04; G02B1/10
Foreign References:
KR20170029896A2017-03-16
KR20130118450A2013-10-30
JP2003122005A2003-04-25
KR20170040470A2017-04-13
JP2002088158A2002-03-27
Attorney, Agent or Firm:
PLUS INTERNATIONAL IP LAW FIRM (KR)
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