Title:
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
Document Type and Number:
WIPO Patent Application WO/2022/244710
Kind Code:
A1
Abstract:
Provided is a novel composition for forming a resist underlayer film. This composition for forming a resist underlayer film contains: a polymer (X) which includes structural units the same as or different from each other and having a hydroxymethyl group and a ROCH2- group (R being a monovalent organic group, or a mixture of these), and a linking group linking the aforementioned structural units; and a solvent.
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Inventors:
ENDO MASAHISA (JP)
HATTORI HAYATO (JP)
TOKUNAGA HIKARU (JP)
HATTORI HAYATO (JP)
TOKUNAGA HIKARU (JP)
Application Number:
PCT/JP2022/020316
Publication Date:
November 24, 2022
Filing Date:
May 16, 2022
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
G03F7/11; C08G65/34; G03F7/20; G03F7/40
Foreign References:
| JP2021015205A | 2021-02-12 |
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
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