Title:
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND SILICON-CONTAINING RESIST UNDERLAYER FILM
Document Type and Number:
WIPO Patent Application WO/2023/008507
Kind Code:
A1
Abstract:
This silicon-containing resist underlayer film has a maximum optical absorption coefficient (k value) of at least 0.05 in a wavelength range of 220-300 nm.
Inventors:
SHIBAYAMA WATARU (JP)
TAKEDA SATOSHI (JP)
SHIGAKI SHUHEI (JP)
NAKAJIMA MAKOTO (JP)
TAKEDA SATOSHI (JP)
SHIGAKI SHUHEI (JP)
NAKAJIMA MAKOTO (JP)
Application Number:
PCT/JP2022/029045
Publication Date:
February 02, 2023
Filing Date:
July 28, 2022
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
G03F7/11; C08G77/22; C08K3/24; C08K5/05; C08K5/06; C08L83/06; G03F7/20; H01L21/027
Domestic Patent References:
| WO2015194555A1 | 2015-12-23 | |||
| WO2020138092A1 | 2020-07-02 | |||
| WO2017043344A1 | 2017-03-16 |
Foreign References:
| JP2006317864A | 2006-11-24 |
Attorney, Agent or Firm:
TAKAOKA Ryoichi et al. (JP)
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