Title:
COMPOSITION FOR A LOW-REFRACTIVE-INDEX FILM
Document Type and Number:
WIPO Patent Application WO/2011/129011
Kind Code:
A1
Abstract:
Disclosed is a composition whereby an easily- and efficiently-formable organic film that contains low-refraction fluorine can be obtained. Fumed silica is blended, as necessary, into a composition comprising: a fluoroalkyl-group-containing methacrylate and/or acrylate compound and/or a fluorine-containing polymer dissolved or dispersed in an organic solvent; an organic compound that has between one and five acryloyl or methacryloyl groups; and a photopolymerization initiator. The result is polymerized and cured to yield a film composition.
Inventors:
YOSHIDA TORU (JP)
KISHIMOTO YASUKAZU (JP)
KISHIMOTO YASUKAZU (JP)
Application Number:
PCT/JP2010/056824
Publication Date:
October 20, 2011
Filing Date:
April 16, 2010
Export Citation:
Assignee:
TOSOH F TECH INC (JP)
YOSHIDA TORU (JP)
KISHIMOTO YASUKAZU (JP)
YOSHIDA TORU (JP)
KISHIMOTO YASUKAZU (JP)
International Classes:
C09D201/04; C09D4/00; C09D4/02; C09D127/12
Foreign References:
| JP2009515218A | 2009-04-09 | |||
| JP2008527083A | 2008-07-24 | |||
| JPS62199643A | 1987-09-03 | |||
| JP2002088122A | 2002-03-27 | |||
| JP2002332313A | 2002-11-22 |
Attorney, Agent or Firm:
SEGAWA KOICHI (JP)
Koichi Segawa (JP)
Koichi Segawa (JP)
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Claims:
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