COMPOSITION METHOD AND PREPARATION METHOD FOR ARRAY SUBSTRATE

WIPO Patent Application WO/2019/015317

A1

A composition method and a preparation method for an array substrate, the composition method comprising: forming in sequence an auxiliary layer film for photolithography (1051) and a positive photoresist layer film (1061) on a substrate (101) on which layers (102, 103) to be patterned are formed; photoetching the auxiliary layer film for photolithography (1051) and the positive photoresist layer film (1061) so as to form an auxiliary layer pattern for photolithography (105) and a positive photoresist pattern (106); composing the layers (102, 103) to be patterned; and applying ultraviolet light to the auxiliary layer pattern for photolithography (105) and the positive photoresist pattern (106), and then removing the auxiliary layer pattern for photolithography (105) and the positive photoresist pattern (106). According to the method, the occurrence of photoresist residue is prevented by means of the auxiliary layer pattern for photolithography (105), thereby improving the yield of an array substrate and the display quality of array substrate-based display devices such as liquid crystal displays (LCD), light-emitting diodes (LED) and organic light-emitting diodes (OLED).

LI WEI (CN)
ZHOU BIN (CN)
LIU JUN (CN)
LIU NING (CN)
ZHANG YANG (CN)
HU YINGBIN (CN)

PCT/CN2018/076373

January 24, 2019

February 12, 2018

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BOE TECHNOLOGY GROUP CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)

G02F1/1362; G03F7/20; G03F7/039

CN107422605A	2017-12-01
US20040127056A1	2004-07-01
TW394986B	2000-06-21
CN106687865A	2017-05-17
CN103399468A	2013-11-20
CN103995441A	2014-08-20

LIU, SHEN & ASSOCIATES (CN)

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