Title:
COMPOSITION, METHOD FOR PRODUCING CURED FILM, AND ELECTRONIC COMPONENT
Document Type and Number:
WIPO Patent Application WO/2018/225748
Kind Code:
A1
Abstract:
Provided are: a composition capable of forming a cured film which can maintain insulation property even in a severe environment such as a high-temperature and high-humidity environment; and a method for producing the cured film. The composition according to the present invention comprises a radically-polymerizable compound, a photoradical generator, and a photo-cation generator, wherein, when the total mass of the composition is 100 mass%, the composition comprises 0.5-100 ppm of halogen atoms.
Inventors:
ANABUKI SHOMA (JP)
ITOU AKINORI (JP)
KAWASHIMA NAOYUKI (JP)
NISHIMURA ISAO (JP)
MIYAKI NOBUYUKI (JP)
KANEKO MASAHIRO (JP)
ITOU AKINORI (JP)
KAWASHIMA NAOYUKI (JP)
NISHIMURA ISAO (JP)
MIYAKI NOBUYUKI (JP)
KANEKO MASAHIRO (JP)
Application Number:
PCT/JP2018/021607
Publication Date:
December 13, 2018
Filing Date:
June 05, 2018
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
C08F2/50; G03F7/004; G03F7/027; G03F7/038; H01L23/12; H05K3/28
Domestic Patent References:
| WO2009022724A1 | 2009-02-19 | |||
| WO2006054461A1 | 2006-05-26 | |||
| WO2017030070A1 | 2017-02-23 |
Foreign References:
| JPH09309944A | 1997-12-02 | |||
| JPH02135350A | 1990-05-24 | |||
| JP2000029212A | 2000-01-28 | |||
| JP2002069108A | 2002-03-08 | |||
| JP2009051017A | 2009-03-12 | |||
| JPS61185542A | 1986-08-19 | |||
| JP2003167331A | 2003-06-13 |
Attorney, Agent or Firm:
OFUCHI, Michie et al. (JP)
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