Title:
COMPOSITION, METHOD FOR TREATING OBJECT TO BE TREATED, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2024/048241
Kind Code:
A1
Abstract:
The present invention provides a composition with outstanding Ru removal properties, the method for treating an object to be treated using the composition, and a method for manufacturing a semiconductor device. The composition according to the present invention includes: a periodic acid or a salt thereof; a quaternary ammonium salt; at least one ionic surfactant selected from the group consisting of an anionic surfactant, a cationic surfactant, and an amphoteric surfactant; and a non-ionic surfactant.
Inventors:
MIZUTANI ATSUSHI (JP)
TAKAHASHI TOMONORI (JP)
NARITA MOE (JP)
TAKAHASHI TOMONORI (JP)
NARITA MOE (JP)
Application Number:
PCT/JP2023/029251
Publication Date:
March 07, 2024
Filing Date:
August 10, 2023
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L21/304; C11D1/02; C11D1/12; C11D1/34; C11D1/68; C11D1/72; C11D1/83; C11D3/26; C11D3/39; H01L21/308
Domestic Patent References:
| WO2022049973A1 | 2022-03-10 | |||
| WO2021005980A1 | 2021-01-14 |
Foreign References:
| JP2009231354A | 2009-10-08 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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