Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
COMPOSITION FOR PATTERN FORMATION
Document Type and Number:
WIPO Patent Application WO/2022/225014
Kind Code:
A1
Abstract:
A composition for pattern formation which comprises: a triazine-ring-containing polymer that includes a repeating unit structure represented by formula (1) and has at least one triazine ring terminal, at least some of the triazine ring terminal having been blocked with an arylamino group substituted by a hydroxyl group; a crosslinking agent; fine inorganic particles each having an alkali-reactive group on the surface; and an organic solvent. (In formula (1), R and R' each independently represent a hydrogen atom or an alkyl, alkoxy, aryl, or aralkyl group, Q represents a C3-C30 divalent group having a ring structure, and * indicates a bond.)

Inventors:
NAKAIE NAOKI (JP)
FURUKAWA TOMOKI (JP)
Application Number:
PCT/JP2022/018430
Publication Date:
October 27, 2022
Filing Date:
April 21, 2022
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C08L79/04; C08G73/06; C08K3/10; H01L51/50; H05B33/02; H05B33/10
Domestic Patent References:
WO2019093203A12019-05-16
WO2013094663A12013-06-27
WO2017138547A12017-08-17
WO2013168788A12013-11-14
WO2021117692A12021-06-17
Foreign References:
JP2014162829A2014-09-08
JP2013245206A2013-12-09
Attorney, Agent or Firm:
TAKAOKA Ryoichi et al. (JP)
Download PDF: