Title:
COMPOSITION FOR PHOTOFABRICATION
Document Type and Number:
WIPO Patent Application WO/2021/054458
Kind Code:
A1
Abstract:
The present invention provides a composition for photofabrication that, when shaped by photofabrication, has outstanding fabrication characteristics and results in outstanding toughness, water resistance, and color tone of a cured article. The present invention relates to a composition for photo fabrication, containing a polymerizable monomer (A) which does not have an acidic group, an organic compound (B) which has an acidic group, a compound (C) (not included in the organic compound (B) having an acidic group) which has a phenol skeleton and does not have a polymerizable group, and a photopolymerization initiator (D), the content of the compound (C) with the phenol skeleton having 0.5–500 parts by mass relative to 100 parts by mass of the organic compound (B) having an acidic group.
Inventors:
ITO MISAKI (JP)
SUZUKI KENJI (JP)
SUZUKI KENJI (JP)
Application Number:
PCT/JP2020/035551
Publication Date:
March 25, 2021
Filing Date:
September 18, 2020
Export Citation:
Assignee:
KURARAY NORITAKE DENTAL INC (JP)
International Classes:
A61C7/08; C08F290/06; A61C13/01; A61K6/60; B29C64/106
Domestic Patent References:
| WO2018038056A1 | 2018-03-01 | |||
| WO2012042911A1 | 2012-04-05 | |||
| WO2017061446A1 | 2017-04-13 | |||
| WO2020129736A1 | 2020-06-25 |
Foreign References:
| JP2019199448A | 2019-11-21 | |||
| JP2019001939A | 2019-01-10 | |||
| JP2018076272A | 2018-05-17 | |||
| JP2014189504A | 2014-10-06 | |||
| JP2015010168A | 2015-01-19 |
Attorney, Agent or Firm:
KAMADA Koichi et al. (JP)
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