COMPOSITION FOR PRODUCTION OF OXIDE THIN FILMS AND METHOD FOR PRODUCING OXIDE THIN FILMS BY USING SAID COMPOSITION

WIPO Patent Application WO/2012/053542

A1

The present invention relates to a composition for the production of oxide thin films and a method for producing oxide thin films by using said composition. More specifically, the present invention relates to: (1) a composition for the production of complex oxide thin films and a method for producing oxide thin films by using said composition (first aspect of the present invention); (2) a composition for the production of zinc oxide thin films, a composition for the production of doped zinc oxide thin films, and a method for producing zinc oxide thin films by using said compositions (second aspect of the present invention); and (3) a composition for the production of zinc oxide thin films, a composition for the production of doped zinc oxide thin films, and a method for producing zinc oxide thin films by using said compositions (third aspect of the present invention).

INABA KOICHIRO (JP)
TOYOTA KOUJI (JP)
HAGA KENICHI (JP)
TOKUDOME KOICHI (JP)
YOSHINO KENJI (JP)
TAKEMOTO YUJIN (JP)

PCT/JP2011/074022

April 26, 2012

October 19, 2011

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TOSOH FINECHEM CORP (JP)
INABA KOICHIRO (JP)
TOYOTA KOUJI (JP)
HAGA KENICHI (JP)
TOKUDOME KOICHI (JP)
YOSHINO KENJI (JP)
TAKEMOTO YUJIN (JP)

C01G15/00; C01G9/02; C07F3/06; C07F5/00; H01L21/28; H01L21/368; H01L29/417

US20080032443A1	2008-02-07
JP2010126402A	2010-06-10
JPH07182939A	1995-07-21
JP2011046566A	2011-03-10
JP2010267383A	2010-11-25
JP2011168407A	2011-09-01
JP2011170979A	2011-09-01

SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)

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