Title:
COMPOSITION FOR UV ABSORPTION AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2024/009548
Kind Code:
A1
Abstract:
Provided are: a composition for UV absorption having excellent dispersibility while having an excellent UV absorption function, in particular absorbing UVA (wavelengths of 315-380 nm) and UVB (wavelengths of 280-315 nm); a method for manufacturing the same; and a UV absorption method in which the same is used. This composition for UV absorption contains carbon-based quantum dots, an aqueous solvent, a surfactant, and an oil-based base. Alternatively, this composition for UV absorption contains carbon-based quantum dots, an aqueous solvent, and a hydrophilic base. This method for manufacturing a composition for UV absorption includes a step for mixing a water dispersion containing carbon-based quantum dots and an aqueous solvent, a surfactant, and an oil-based base. This method for manufacturing a composition for UV absorption includes a step for mixing a water dispersion containing carbon-based quantum dots and an aqueous solvent, and a hydrophilic base.
Inventors:
TAKETOMI SHO (JP)
MORI RYOHEI (JP)
MORI RYOHEI (JP)
Application Number:
PCT/JP2023/005774
Publication Date:
January 11, 2024
Filing Date:
February 17, 2023
Export Citation:
Assignee:
FUJI PIGMENT (JP)
GS ALLIANCE CO LTD (JP)
GS ALLIANCE CO LTD (JP)
International Classes:
A61Q17/04; A61K8/06; A61K8/30; A61K8/31; A61K8/37
Domestic Patent References:
WO2021006490A1 | 2021-01-14 |
Foreign References:
JPH09278625A | 1997-10-28 | |||
CN107714493A | 2018-02-23 | |||
KR101710907B1 | 2017-02-28 | |||
JP2011184495A | 2011-09-22 | |||
JP2016020417A | 2016-02-04 | |||
JP2021080346A | 2021-05-27 | |||
JP2018203630A | 2018-12-27 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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