Title:
COMPOUND, ACID GENERATOR CONTAINING SAID COMPOUND, PHOTORESIST, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING SAID PHOTORESIST
Document Type and Number:
WIPO Patent Application WO/2023/199841
Kind Code:
A1
Abstract:
The present invention provides a novel compound which has photosensitivity to both h-rays and i-rays and is easily decomposed and generates a sulfonic acid, which is a strong acid, when irradiated with either h-rays or i-rays. A compound (1) according to the present invention is represented by formula (1). In formula (1), R1 to R3 may be the same or different and each represent an optionally substituted hydrocarbon group. The compound (1) according to the present invention has a molar absorption coefficient of h-rays of, for example, 100 (mL/g∙cm) or more. In addition, the solubility thereof in propylene glycol monomethyl ether acetate at 25°C is, for example, 5% by weight or more.
Inventors:
SHIBAGAKI TOMOYUKI (JP)
NAKAMURA YUJI (JP)
KAJIHARA TAKUTO (JP)
KIZU TOMOHITO (JP)
NAKAMURA YUJI (JP)
KAJIHARA TAKUTO (JP)
KIZU TOMOHITO (JP)
Application Number:
PCT/JP2023/014252
Publication Date:
October 19, 2023
Filing Date:
April 06, 2023
Export Citation:
Assignee:
SAN APRO LTD (JP)
International Classes:
C07D311/14; C09K3/00; G03F7/004; G03F7/039
Domestic Patent References:
| WO2016072049A1 | 2016-05-12 |
Other References:
BONSIGNORE LEONARDO, LOY GIUSEPPE, SECCI MARIO, CABIDDU SALVATORE: "Novel reactions of carbon suboxide. IV. Synthesis of some N-Hydroxy-2-oxo-2H-1-benzopyran-3-carboxamides", TETRAHEDRON LETTERS, ELSEVIER, AMSTERDAM , NL, vol. 24, no. 45, 1 January 1983 (1983-01-01), Amsterdam , NL , pages 5013 - 5016, XP093098649, ISSN: 0040-4039, DOI: 10.1016/S0040-4039(01)99836-3
Attorney, Agent or Firm:
G-CHEMICAL INTELLECTUAL PROPERTY FIRM (JP)
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