Title:
COMPOUND, COMPOSITION CONTAINING THE COMPOUND, AND METHOD OF MANUFACTURING DEVICE USING SAME
Document Type and Number:
WIPO Patent Application WO/2016/133073
Kind Code:
A1
Abstract:
Provided is a compound which has a Hammett substituent constant σ of -0.05 or lower and which is represented by general formula (1).
(1)
(In formula (1): Ar1 and Ar2 each independently represent an optionally substituted phenylene group; R1 represents one selected from the group consisting of optionally substituted thioalkoxy groups, arylthio groups, alkoxyphenyl groups, and thioalkoxyphenyl groups; X represents one selected from the group consisting of a sulfur atom, an oxygen atom, and a direct bond; R2 represents one of optionally substituted alkyl groups and phenyl group; Y's each independently represent one of an oxygen atom and a sulfur atom; and R3 and R4 each independently represent one selected from the group consisting of optionally substituted linear, branched, or cyclic alkyl groups, alkenyl groups, and alkynyl groups, the R3 and R4 optionally binding with each other to form a ring structure together with the two Y's in the formula.)
Inventors:
ENOMOTO SATOSHI (JP)
SUGA YUSUKE (JP)
SUGA YUSUKE (JP)
Application Number:
PCT/JP2016/054410
Publication Date:
August 25, 2016
Filing Date:
February 16, 2016
Export Citation:
Assignee:
TOYO GOSEI CO LTD (JP)
International Classes:
C07C323/19; C07D317/22; G03F7/004; G03F7/039; G03F7/20; G03F7/38
Domestic Patent References:
| WO2015174072A1 | 2015-11-19 | |||
| WO2015019616A1 | 2015-02-12 |
Foreign References:
| JP2015134904A | 2015-07-27 | |||
| JP2015061831A | 2015-04-02 | |||
| JP2003286278A | 2003-10-10 |
Other References:
KAMATA,MASAKI ET AL.: "Pyrylium salt sensitized photochemical deprotections of dithioacetals snd ketals", TETRAHEDRON, vol. 50, no. 45, 1994, pages 12821 - 12828
Attorney, Agent or Firm:
KURIHARA, HIROYUKI (JP)
Hiroyuki Kurihara (JP)
Hiroyuki Kurihara (JP)
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