Title:
COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2014/123102
Kind Code:
A9
Abstract:
This material for forming an underlayer film for lithography contains a compound represented by general formula (I). (In formula (I): X each independently is an oxygen atom or a sulfur atom; R1 is a single bond or a 2n-valent hydrocarbon group having 1-30 carbon atoms, said hydrocarbon group optionally having a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6-30 carbon atoms; R2 each independently is a straight-chain, branched, or cyclic alkyl group having 1-10 carbon atoms, an aryl group having 6-10 carbon atoms, an alkenyl group having 2-10 carbon atoms, or a hydroxyl group, where at least one R2 is a hydroxyl group; m each independently is an integer from 1 to 4; n is an integer from 1 to 4; and p is 0 or 1.)
Inventors:
ECHIGO MASATOSHI (JP)
MAKINOSHIMA TAKASHI (JP)
UCHIYAMA NAOYA (JP)
MAKINOSHIMA TAKASHI (JP)
UCHIYAMA NAOYA (JP)
Application Number:
PCT/JP2014/052524
Publication Date:
April 30, 2015
Filing Date:
February 04, 2014
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07D311/86; G03F7/11; G03F7/26; H01L21/027
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
Yoshiyuki Inaba (JP)
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