COMPOUND, AND PHOTORESIST COMPOSITION CONTAINING SAME

Title:

COMPOUND, AND PHOTORESIST COMPOSITION CONTAINING SAME

Document Type and Number:

WIPO Patent Application WO/2015/129700

Kind Code:

A1

Abstract:

This compound is selected from among the group consisting of the specific compounds represented by formulae (1-1) and (1-2). By having this type of structure, this compound exhibits high heat resistance and high solubility and can reduce resist pattern roughness when used as a raw material for a resist material. This compound can be advantageously used as, for example, a base compound for a photosensitive material such as a semiconductor photoresist.

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Inventors:

TOIDA TAKUMI (JP)
TAKASUKA MASAAKI (JP)
SATO TAKASHI (JP)
ECHIGO MASATOSHI (JP)

Application Number:

PCT/JP2015/055265

Publication Date:

September 03, 2015

Filing Date:

February 24, 2015

Export Citation:

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Assignee:

MITSUBISHI GAS CHEMICAL CO (JP)

International Classes:

C07C43/23; C07C69/017; C07C69/24; G03F7/039

Domestic Patent References:

WO2011065004A1	2011-06-03
WO2014038680A1	2014-03-13

Foreign References:

JP2003321423A

2003-11-11

Other References:

HIROTO KUDO ET AL.: "The synthesis and photo- induced deprotection reaction of calix[4] resorcinarene derivatives containing tert-butyl ester moieties", BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, vol. 77, no. 4, 2004, pages 819 - 826, XP003023934
G. MANN ET AL.: "Influence of aromatic substituents on the configuration and conformation of calyx[4]areneoctols", JOURNAL OF PHYSICAL ORGANIC CHEMISTRY, vol. 2, no. 7, 1989, pages 531 - 539, XP055220134

Attorney, Agent or Firm:

INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)

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