Title:
COMPOUNDS, PROCESS FOR PRODUCTION THEREOF, LOW-MOLECULAR COMPOUNDS, POSITIVE RESIST COMPOSITIONS AND PROCESS FOR FORMATION OF RESIST PATTERNS
Document Type and Number:
WIPO Patent Application WO/2007/013471
Kind Code:
A1
Abstract:
Compounds represented by the general formula (I) or (I’) wherein R11 to R13 are each alkyl having 1 to 10 carbon atoms; s is an integer of 1 to 2; t is an integer of 1 to 3; u is an integer of 1 to 3; the sum of s, t and u is an integer of 3 to 5; q is an integer of 0 to 2; r is an integer of 1 to 3; and p is 1 or 2.
Inventors:
SHIONO DAIJU (JP)
HIRAYAMA TAKU (JP)
HADA HIDEO (JP)
HIRAYAMA TAKU (JP)
HADA HIDEO (JP)
Application Number:
PCT/JP2006/314696
Publication Date:
February 01, 2007
Filing Date:
July 25, 2006
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
SHIONO DAIJU (JP)
HIRAYAMA TAKU (JP)
HADA HIDEO (JP)
SHIONO DAIJU (JP)
HIRAYAMA TAKU (JP)
HADA HIDEO (JP)
International Classes:
C07C59/70; C07C51/09; C07C51/353; C07C65/105; C07C69/736; G03F7/004; G03F7/039; C07B61/00
Foreign References:
| JPH02273641A | 1990-11-08 | |||
| GB2395569A | 2004-05-26 | |||
| JP2002296729A | 2002-10-09 | |||
| JP2000212130A | 2000-08-02 |
Attorney, Agent or Firm:
TANAI, Sumio et al. (Yaesu Chuo-k, Tokyo 53, JP)
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