Title:
CONDUCTIVE PATTERN ARRANGEMENT METHOD AND CONDUCTIVE PATTERN STRUCTURE, CONDUCTIVE MESH, PHOTOMASK, STAMPER, AND TOUCH SCREEN PANEL FORMED BY USING SAME METHOD
Document Type and Number:
WIPO Patent Application WO/2018/070682
Kind Code:
A2
Abstract:
The present invention provides a conductive pattern arrangement method which can prevent a Moire phenomenon and reduce visibility of a conductive line. A conductive pattern arrangement method according to an embodiment of the present invention comprises the steps of: configuring a first set pitch mean and a first set pitch standard deviation; arranging a plurality of parallel first conductive lines by using the first set pitch mean and the first set pitch standard deviation; configuring a second set pitch mean and a second set pitch standard deviation; and arranging a plurality of parallel second conductive lines having a particular angle with respect to the first conductive lines by using the second set pitch mean and the second set pitch standard deviation.
Inventors:
JUNG KYUNG HO (KR)
Application Number:
PCT/KR2017/010365
Publication Date:
April 19, 2018
Filing Date:
September 21, 2017
Export Citation:
Assignee:
INTREE CO LTD (KR)
International Classes:
H01B13/00; G06F3/044
Attorney, Agent or Firm:
YANG, Heui Young (KR)
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