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Title:
CONSTRUCTIVE NANOLITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO2001061330
Kind Code:
A3
Abstract:
On a patterned organic methyl-terminated monolayer or multilayer film self-assembled on solid substrate, a pattern consisting of a site-defined surface chemical modification non-destructively inscribed in the organic monolayer or multilayer by means of an electrically biased conducting scanning probe device, stamping device and/or liquid metal or metal alloy or any other device that can touch the organic monolayer or multilayer surface and inscribe therein a chemical modification pattern upon application of an electrical bias. An nanoshuchere composed of a conductive material, e.g. metal, is created on top or in between said monolayer or multilayer.

Inventors:
SAGIV JACOB (IL)
MAOZ RIVKA (IL)
COHEN SIDNEY R (IL)
FRYDMAN ELI (FR)
Application Number:
PCT/IL2001/000152
Publication Date:
December 13, 2001
Filing Date:
February 19, 2001
Export Citation:
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Assignee:
YEDA RES & DEV (IL)
SAGIV JACOB (IL)
MAOZ RIVKA (IL)
COHEN SIDNEY R (IL)
FRYDMAN ELI (FR)
International Classes:
B82B3/00; (IPC1-7): B82B3/00; G11B9/00; G12B21/08
Foreign References:
EP0481362A21992-04-22
Other References:
MAOZ R ET AL: "NANOELECTROCHEMICAL PATTERNING OF MONOLAYER SURFACES: TOWARD SPATIALLY DEFINED SELF-ASSEMBLY OF NANOSTRUCTURES", ADVANCED MATERIALS, VCH VERLAGSGESELLSCHAFT, WEINHEIM, DE, vol. 11, no. 1, 7 January 1999 (1999-01-07), pages 55 - 61, XP000790793, ISSN: 0935-9648
PERKINS F K ET AL: "JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 12, no. 6, November 1994 (1994-11-01), pages 3725 - 3730, XP001006283, ISSN: 0734-211X
MAOZ R ET AL: "CONSTRUCTIVE NANOLITHOGRAPHY: SITE-DEFINED SILVER SELF-ASSEMBLY ON NANOELECTROCHEMICALLY PATTERNED MONOLAYER TEMPLATES", ADVANCED MATERIALS, VCH VERLAGSGESELLSCHAFT, WEINHEIM, DE, vol. 12, no. 6, 16 March 2000 (2000-03-16), pages 424 - 429, XP000923872, ISSN: 0935-9648
MAOZ R, FRYDMAN E, COHEN R, SAGIV J: ""Constructive Nanolithography": Inert Monolayers as Patternable Templates for In-Situ Nanofabrication of Metal-Semiconductor-Organic Surface Structures - A Generic Approach", ADVANCED MATERIALS, vol. 12, no. 10, 22 May 2000 (2000-05-22), Weinheim, pages 725 - 731, XP002176952
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