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Title:
CONTROL DEVICE AND LASER PROCESSING DEVICE COMPRISING SAME, AND METHOD FOR CONTROLLING DISPLACEMENT OF PROCESSING START POINT OF LASER EMISSION MECHANISM OF LASER PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/209792
Kind Code:
A1
Abstract:
The present invention relates to: a control device for a laser processing device comprising a laser emission mechanism that emits processing laser light in a direction along a unit vector, and a gap sensor provided in the laser emission mechanism; and a method for controlling displacement of a processing start point. The control device comprises: a main control unit that outputs a driving command to a constituent element of the laser processing device on the basis of a processing program; and a displacement command generation unit that generates a displacement command for displacing the laser emission mechanism using a detected value from a gap sensor. The displacement command generation unit has a function of generating: an approach command for displacing the laser emission mechanism from a control start position toward a laser irradiation point to a boundary gap point where the gap sensor starts detection; and a processing start point displacement command for displacing the laser emission mechanism from the boundary gap point to a processing start point within a detection range of the gap sensor. The processing start point displacement command includes a pose change that matches the unit vector at the boundary gap point with a processing vector at the processing start point.

Inventors:
TAKARAZAWA SHUN (JP)
YAMAMOTO KENTA (JP)
Application Number:
PCT/JP2022/018836
Publication Date:
November 02, 2023
Filing Date:
April 26, 2022
Export Citation:
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Assignee:
FANUC CORP (JP)
International Classes:
B23K26/00; B23K26/08; B23K26/082
Foreign References:
JP2019005800A2019-01-17
JP2008110389A2008-05-15
JPH0535327A1993-02-12
JP2000343255A2000-12-12
Attorney, Agent or Firm:
AIWA INTERNATIONAL PATENT AGENCY (JP)
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