Title:
COPOLYMER, COPOLYMER SOLUTION, PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR PRODUCING COPOLYMER, AND METHOD FOR PRODUCING COPOLYMER SOLUTION
Document Type and Number:
WIPO Patent Application WO/2022/030445
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a copolymer which can provide a cured article having excellent solvent resistance under low-temperature curing conditions and can be used suitably as a heat-curable resin in various use applications including a color filter. The present invention is a copolymer characterized by comprising (A) an epoxy-group-containing structural unit represented by general formula (1) and (B) an acidic-group-containing structural unit represented by general formula (2), and also characterized in that the epoxy equivalent is 20000 or less. (In formula (1), R1 represents a hydrogen atom or a methyl group; R2 represents a direct bond or a bivalent organic group; and X represents an epoxy-group-containing group.) (In formula (2), R3 represents a hydrogen atom or a methyl group; R4 represents a direct bond or an organic group; R5 represents a bond chain having a length of 2 atoms or more; Y represents an acidic group; and a represents 0 or 1.)
Inventors:
MATSUURA HIROKI (JP)
MAEDA NOBUHIRO (JP)
TERADA TAKUMA (JP)
HIRAOKA RYUICHI (JP)
MAEDA NOBUHIRO (JP)
TERADA TAKUMA (JP)
HIRAOKA RYUICHI (JP)
Application Number:
PCT/JP2021/028611
Publication Date:
February 10, 2022
Filing Date:
August 02, 2021
Export Citation:
Assignee:
NIPPON CATALYTIC CHEM IND (JP)
International Classes:
C08F220/32; C08F2/44; C08F8/14; C08L33/14; G03F7/004; G03F7/033
Domestic Patent References:
| WO2019188376A1 | 2019-10-03 |
Foreign References:
| JP2004051953A | 2004-02-19 | |||
| JPS61111380A | 1986-05-29 | |||
| JPS52123427A | 1977-10-17 | |||
| JPS62256806A | 1987-11-09 | |||
| JPH0749566A | 1995-02-21 |
Attorney, Agent or Firm:
YASUTOMI & ASSOCIATES (JP)
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