Title:
COPPER ALLOY PLASTIC WORKING MATERIAL, COPPER ALLOY ROD MATERIAL, COMPONENT FOR ELECTRONIC/ELECTRICAL DEVICES, AND TERMINAL
Document Type and Number:
WIPO Patent Application WO/2022/004803
Kind Code:
A1
Abstract:
This copper alloy plastic working material has a composition that contains more than 10 mass ppm but not more than 100 mass ppm of Mg, with the balance being made up of Cu and unavoidable impurities; among the unavoidable impurities, S is set to 10 mass ppm or less, P is set to 10 mass ppm or less, Se is set to 5 mass ppm or less, Te is set to 5 mass ppm or less, Sb is set to 5 mass ppm or less, Bi is set to 5 mass ppm or less and As is set to 5 mass ppm or less, with the total of S, P, Se, Te, Sb, Bi and As being set to 30 mass ppm or less; and the mass ratio (Mg)/(S + P + Se + Te + Sb + Bi + As) is set within the range of from 0.6 to 50. This copper alloy plastic working material has a conductivity of 97% IACS or more, a tensile strength of 275 MPa or less, and a heat resistance of not less than 150˚C after being subjected to drawing with the reduction ratio in cross-sectional area of 25%.
Inventors:
MATSUNAGA HIROTAKA (JP)
ITO YUKI (JP)
FUKUOKA KOSEI (JP)
MAKI KAZUNARI (JP)
MORIKAWA KENJI (JP)
FUNAKI SHINICHI (JP)
MORI HIROYUKI (JP)
ITO YUKI (JP)
FUKUOKA KOSEI (JP)
MAKI KAZUNARI (JP)
MORIKAWA KENJI (JP)
FUNAKI SHINICHI (JP)
MORI HIROYUKI (JP)
Application Number:
PCT/JP2021/024797
Publication Date:
January 06, 2022
Filing Date:
June 30, 2021
Export Citation:
Assignee:
MITSUBISHI MATERIALS CORP (JP)
International Classes:
C22C9/00; H01B1/02; H01B5/02; C22F1/00; C22F1/08
Domestic Patent References:
WO2021107096A1 | 2021-06-03 |
Foreign References:
JPS5789448A | 1982-06-03 | |||
US20060198757A1 | 2006-09-07 | |||
JPS5794537A | 1982-06-12 | |||
JPS4915324B1 | 1974-04-13 | |||
JP2016056414A | 2016-04-21 | |||
JP2020112927A | 2020-07-27 | |||
JP2020112695A | 2020-07-27 | |||
JP2021091161A | 2021-06-17 | |||
JP2016056414A | 2016-04-21 |
Attorney, Agent or Firm:
MATSUNUMA Yasushi et al. (JP)
Download PDF:
Previous Patent: COSMETIC COMPOSITION
Next Patent: ELECTROSTATIC WITHSTAND VOLTAGE TESTING DEVICE AND ELECTROSTATIC WITHSTAND VOLTAGE TESTING METHOD
Next Patent: ELECTROSTATIC WITHSTAND VOLTAGE TESTING DEVICE AND ELECTROSTATIC WITHSTAND VOLTAGE TESTING METHOD