COSMETIC FOR CORRECTING BUMPS AND DIPS

Title:

COSMETIC FOR CORRECTING BUMPS AND DIPS

Document Type and Number:

WIPO Patent Application WO/2017/204281

Kind Code:

A1

Abstract:

The present invention addresses the problem of providing a cosmetic for correcting bumps and dips, which has a superior effect of hiding wrinkles and pores, and correcting bumps and dips on the skin, and is highly compatible with cosmetics. The present invention is based on the finding that a cosmetic for correcting bumps and dips, which hides wrinkles and pores when applied, and is highly compatible with cosmetics, can be easily provided by using a specific polyacrylic acid water-absorbent polymer having water-absorbent capability instead of water-soluble polymers having the thickening effect which are commonly used in cosmetics. Specifically, the cosmetic for correcting bumps and dips according to the present invention contains a polyacrylic acid water-absorbent polymer and has a superior effect of hiding wrinkles and bumps, wherein the polyacrylic acid water-absorbent polymer has an average particle size of 10-150 μm when swollen, an average particle size of 10-50 μm when dried, and a water absorbency of 5-50 g/g.

Inventors:

MORI RIKAKO (JP)
YAMAGUCHI SHUNSUKE (JP)
SATONAKA TAKAMASA (JP)

Application Number:

PCT/JP2017/019474

Publication Date:

November 30, 2017

Filing Date:

May 25, 2017

Export Citation:

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Assignee:

NIKKO CHEMICALS (JP)
COSMOS TECHNICAL CENTER CO LTD (JP)
TOAGOSEI CO LTD (JP)

International Classes:

C08F20/06; A61K8/81; A61Q1/02; A61Q19/00; C08F220/06

Domestic Patent References:

WO2008015870A1	2008-02-07
WO2012033078A1	2012-03-15
WO2012023376A1	2012-02-23

Foreign References:

JP2004210654A	2004-07-29
JP2004331760A	2004-11-25

Other References: