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Title:
CURABLE COMPOSITION FOR NANOIMPRINT, SEMICONDUCTOR ELEMENT, AND NANOIMPRINT METHOD
Document Type and Number:
WIPO Patent Application WO/2011/125800
Kind Code:
A1
Abstract:
Disclosed is a curable composition for nanoimprint, which contains (A) a polymerizable compound, (B) a fluorine atom-containing polymer and (C) a radical generator. It is preferable that the content of the fluorine atom-containing polymer (B) is 0.1-10 parts by mass (inclusive) relative to 100 parts by mass of the polymerizable compound (A). It is preferable that the weight average molecular weight of the fluorine atom-containing polymer (B) in terms of polystyrene as determined by gel permeation chromatography is 1,000-30,000 (inclusive). It is preferable that the fluorine atom-containing polymer (B) contains a polymer that has at least one structural unit selected from the group consisting of structural units represented by formula (B-1) and structural units represented by formula (B-2).

Inventors:
OKAMOTO MASASHI (JP)
NISHIMURA YUKIO (JP)
Application Number:
PCT/JP2011/058139
Publication Date:
October 13, 2011
Filing Date:
March 30, 2011
Export Citation:
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Assignee:
JSR CORP (JP)
OKAMOTO MASASHI (JP)
NISHIMURA YUKIO (JP)
International Classes:
H01L21/027; B29C59/02; C08F2/44; C08F12/20; C08L101/04
Domestic Patent References:
WO2008155928A12008-12-24
WO2007116664A12007-10-18
WO2006114958A12006-11-02
Foreign References:
JP2007304537A2007-11-22
JP2008088343A2008-04-17
JP2010032994A2010-02-12
JP2007001250A2007-01-11
JP2010109092A2010-05-13
Attorney, Agent or Firm:
AMANO KAZUNORI (JP)
Kazuki Amano (JP)
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Claims: