Title:
CURABLE COMPOSITION AND PATTERN MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/208613
Kind Code:
A1
Abstract:
The curable composition according to the present invention contains at least one type of polymerizable compound represented by formula (1) or formula (2), and a polymerization initiator. The curable composition has relatively fast photocuring speed, and can be suitably used in pattern formation using ink printing technology. (In the formulas, R1 is a hydrogen atom or a methyl group, R2 is a divalent or trivalent straight-chain, branched, or cyclic aliphatic hydrocarbon group, or a divalent or trivalent aromatic group, R3 is a divalent or trivalent aromatic group, and m and n are the integer 1 or 2.)
Inventors:
MASUBUCHI TAKASHI (JP)
KIKUCHI MIEKO (JP)
MIYAZAWA SATORU (JP)
OGAWA TSUYOSHI (JP)
TANAKA YUSUKE (JP)
KIKUCHI MIEKO (JP)
MIYAZAWA SATORU (JP)
OGAWA TSUYOSHI (JP)
TANAKA YUSUKE (JP)
Application Number:
PCT/JP2019/017360
Publication Date:
October 31, 2019
Filing Date:
April 24, 2019
Export Citation:
Assignee:
CENTRAL GLASS CO LTD (JP)
International Classes:
C08F20/26; C08F12/24; H01L21/027
Domestic Patent References:
| WO2011125800A1 | 2011-10-13 |
Foreign References:
| JP2008046541A | 2008-02-28 | |||
| JP2010250074A | 2010-11-04 | |||
| JP2009051017A | 2009-03-12 | |||
| JP2010114209A | 2010-05-20 |
Attorney, Agent or Firm:
KOBAYASHI, Hiromichi et al. (JP)
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