Title:
CURABLE RESIN COMPOSITION AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2018/181251
Kind Code:
A1
Abstract:
Provided is a composition containing a block copolymer having a structural unit formed of polymer block (A)/polymer block (B)/polymer block (A), as a curable resin composition. The polymer block (A) is a polymer that includes, as a main constituent monomer, at least one selected from the group consisting of (meth)acrylic acid alkyl esters, (meth)acrylic acid alkoxy alkyl esters, and compounds represented by general formula (1), that has a glass transition temperature of 0ºC or less, and that contains, on average, at least 1.0 crosslinkable functional group per block. The polymer block (B) is a polymer that includes, as a main constituent monomer, at least one selected from the group consisting of (meth)acrylic acid alkyl esters, (meth)acrylic acid alkoxy alkyl esters, and compounds represented by general formula (1), and that has a glass transition temperature of 0ºC or less. The difference in SP value between the polymer block (A) and the polymer block (B) is 0.1 or more. (1): CH2=CR1-C(=O)O(R2O)n-R3 (in the formula, R1 represents hydrogen or a methyl group, R2 represents a straight-chain or branched alkylene group having 2-6 carbon atoms, R3 represents hydrogen, an alkyl group having 1-20 carbon atoms, or an aryl group having 6-20 carbon atoms. Further, n represents an integer of 1-100.)
Inventors:
KAAI MICHIHIRO (JP)
SHIBATA AKITSUGU (JP)
SHIBATA AKITSUGU (JP)
Application Number:
PCT/JP2018/012304
Publication Date:
October 04, 2018
Filing Date:
March 27, 2018
Export Citation:
Assignee:
TOAGOSEI CO LTD (JP)
International Classes:
C08F293/00
Domestic Patent References:
| WO2016027602A1 | 2016-02-25 | |||
| WO2017014154A1 | 2017-01-26 | |||
| WO2017110439A1 | 2017-06-29 |
Foreign References:
| JP2001200026A | 2001-07-24 | |||
| JP2011026393A | 2011-02-10 |
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