Title:
CURED FILM-FORMING COMPOSITION, ALIGNMENT MATERIAL, AND PHASE DIFFERENCE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2015/030000
Kind Code:
A1
Abstract:
[Problem] To provide a cured film-forming composition that forms a cured film having excellent photoreaction efficiency and solvent resistance, and to provide an alignment material for optical alignment and a phase difference material formed using this alignment material. [Solution] Provided is a cured film-forming composition containing (A) a compound having a photo-aligning group and at least one substituent group selected from among a hydroxyl group, a carboxyl group, and an amino group, (B) a polyamide in which at least some of the nitrogen atoms in the amide groups are alkoxymethylated or alkylthiomethylated, and (C) a crosslinking catalyst. A cured film is formed using this cured film-forming composition, and an alignment material is formed by using a photo-alignment technique. A phase difference material is obtained by coating polymerizable liquid crystals on the alignment material and then curing the polymerizable liquid crystals.
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Inventors:
HATANAKA TADASHI (JP)
YUKAWA SHOJIRO (JP)
YUKAWA SHOJIRO (JP)
Application Number:
PCT/JP2014/072305
Publication Date:
March 05, 2015
Filing Date:
August 26, 2014
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
C08L77/00; C08F2/44; C08F2/48; C08K5/00; G02B5/30; G02F1/1337
Domestic Patent References:
| WO2014104320A1 | 2014-07-03 | |||
| WO2011126021A1 | 2011-10-13 | |||
| WO2013191251A1 | 2013-12-27 | |||
| WO2014010688A1 | 2014-01-16 | |||
| WO2011126022A1 | 2011-10-13 |
Foreign References:
| JP2007121721A | 2007-05-17 | |||
| JP2009222791A | 2009-10-01 | |||
| JP2009287002A | 2009-12-10 |
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
Sepal Tsuneo (JP)
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