CURVED FACE DIFFRACTION GRATING FABRICATION METHOD, CURVED FACE DIFFRACTION GRATING CAST, AND CURVED FACE DIFFRACTION GRATING EMPLOYING SAME

Title:

CURVED FACE DIFFRACTION GRATING FABRICATION METHOD, CURVED FACE DIFFRACTION GRATING CAST, AND CURVED FACE DIFFRACTION GRATING EMPLOYING SAME

Document Type and Number:

WIPO Patent Application WO/2013/183601

Kind Code:

A1

Abstract:

An objective of the present invention is to manufacture with high precision a curved face diffraction grating having a desired curvature. Provided is a curved face diffraction grating fabrication method, comprising: a step of forming a diffraction grating pattern (20) upon a flat-shaped silicon substrate (2); a step of pressing a fixing substrate (3) in a heated state and having a desired curved face shape upon the silicon substrate (2) whereupon the diffraction grating pattern is formed, curving a face of the silicon substrate, fixing upon the fixing substrate (3) having the curved face shape the silicon substrate (2) having the diffraction pattern, and forming a curved face diffraction grating cast; and a step of bringing a member having flexibility into contact with the curved face diffraction grating cast, and transferring the diffraction grating pattern upon the member.

Inventors:

AONO TAKANORI (JP)
EBATA YOSHISADA (JP)
MATSUI SHIGERU (JP)
WATANABE TETSUYA (JP)
ONODA YUGO (JP)

Application Number:

PCT/JP2013/065398

Publication Date:

December 12, 2013

Filing Date:

June 03, 2013

Export Citation:

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Assignee:

HITACHI HIGH TECH CORP (JP)

International Classes:

G02B5/18; B29C59/02; B29L11/00

Domestic Patent References:

WO2008081555A1

2008-07-10

Foreign References:

JPH08211214A	1996-08-20
JP2010025723A	2010-02-04
JPS6172202A	1986-04-14
JPH095509A	1997-01-10
JPS55133004A	1980-10-16
JPS6172202A	1986-04-14
JPH0829610A	1996-02-02
JPH095509A	1997-01-10
JP2010025723A	2010-02-04

Other References: