Title:
DC PULSE PLASMA SUBSTRATE TREATMENT APPARATUS
Document Type and Number:
WIPO Patent Application WO/2023/068696
Kind Code:
A1
Abstract:
A substrate treatment apparatus, according to one embodiment of the present invention, comprises: a remote plasma generator for generating remote plasma and an active species; an upper chamber having an opening connected to an output port of the remote plasma generator, and receiving and diffusing the active species of the remote plasma generator; a lower chamber for receiving the active species which has been diffused in the upper chamber; a main baffle for partitioning the upper chamber and the lower chamber and permeating the active species; a substrate holder for supporting a substrate disposed in the lower chamber; a RF power source for forming main plasma by applying RF power to the substrate holder; and a DC pulse power source for applying a DC pulse to the substrate holder.
Inventors:
JEON BUIL (KR)
SHIN TAEHO (KR)
LIM DOOHO (KR)
PARK JUNGSU (KR)
ON BUMSOO (KR)
LEE SEUNGHO (KR)
SHIN TAEHO (KR)
LIM DOOHO (KR)
PARK JUNGSU (KR)
ON BUMSOO (KR)
LEE SEUNGHO (KR)
Application Number:
PCT/KR2022/015710
Publication Date:
April 27, 2023
Filing Date:
October 17, 2022
Export Citation:
Assignee:
INNOVATION FOR CREATIVE DEVICES CO LTD (KR)
International Classes:
H01J37/32
Foreign References:
| KR20160099635A | 2016-08-22 | |||
| KR20210077597A | 2021-06-25 | |||
| US20210159107A1 | 2021-05-27 | |||
| KR20190027084A | 2019-03-14 | |||
| KR20110083049A | 2011-07-20 | |||
| KR20140028703A | 2014-03-10 | |||
| KR101094424B1 | 2011-12-15 | |||
| KR20150143793A | 2015-12-23 |
Attorney, Agent or Firm:
NURY PATENT LAW FIRM (KR)
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