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Patent Searching and Data


Title:
DECORATIVE SHEET AND METHOD FOR MANUFACTURING DECORATIVE SHEET
Document Type and Number:
WIPO Patent Application WO/2022/145137
Kind Code:
A1
Abstract:
Provided is a decorative sheet having exceptional design properties involving low luster, and also having fingerprint resistance, a high degree of durability (particularly scratch resistance and soiling resistance), and processing properties. The decorative sheet (1) according to the present embodiment comprises an original-fabric layer (2), and a surface-protective layer (5) provided on one surface of the original-fabric layer (2). The surface-protective layer (5) has a ridged section provided so as to protrude in the form of ridges on the surface thereof, and is configured such that a regular relief shape is formed on said surface. The ratio RSm/Ra of the regular relief shape on the surface-protective layer (5) is within the range of 10-300 (inclusive). The main material of the surface-protective layer (5) is an ionizing-radiation-curable resin. The main component of the ionizing-radiation-curable resin is a trifunctional acrylic resin that includes a repeating structure. The repeating structure is any one from among an ethylene oxide structure, a propylene oxide structure, and a ε-caprolactone structure. The number of repetitions of the repeating structure is three or greater.

Inventors:
AKUTSU ERIKA (JP)
Application Number:
PCT/JP2021/041624
Publication Date:
July 07, 2022
Filing Date:
November 11, 2021
Export Citation:
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Assignee:
TOPPAN INC (JP)
International Classes:
B32B27/00; B32B3/30; B32B27/30
Domestic Patent References:
WO2014034850A12014-03-06
WO2016021655A12016-02-11
Foreign References:
KR20200031282A2020-03-24
US6663952B12003-12-16
KR20200059905A2020-05-29
US20200024439A12020-01-23
US20150354132A12015-12-10
JP2020111715A2020-07-27
JP2016099671A2016-05-30
JP2017171794A2017-09-28
US20160152833A12016-06-02
JP2017128634A2017-07-27
JP2019066643A2019-04-25
KR20200061292A2020-06-02
KR20200025050A2020-03-10
Attorney, Agent or Firm:
HIROSE Hajime et al. (JP)
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