DEPOSITION DEVICE AND DEPOSITION METHOD

Title:

DEPOSITION DEVICE AND DEPOSITION METHOD

Document Type and Number:

WIPO Patent Application WO/2015/064194

Kind Code:

A1

Abstract:

This deposition device is provided with a treatment container. A mounting platform is arranged in the treatment container, and a metal target is provided above the mounting platform. Further, a head is configured to jet an oxidizing gas towards the mounting platform. This head can move between a first region, which is between the metal target and the mounting region where workpieces are mounted on the mounting platform, and a second region which is separated from the space between the metal target and the mounting region.

More Like This:

WO/2002/032659	BARRIER FILM AND METHOD FOR PRODUCTION THEREOF
JP2013543054	A method for improving the hydrophilicity of a coating film by surface morphology treatment and a superhydrophilic glass coating layer produced using this method.

Inventors:

KOJIMA YASUHIKO (JP)
SONE HIROSHI (JP)
GOMI ATSUSHI (JP)
NAKAMURA KANTO (JP)
KITADA TOORU (JP)
SUZUKI YASUNOBU (JP)
SUZUKI YUUSUKE (JP)
TAKATSUKI KOICHI (JP)
HIRASAWA TATSUO (JP)
SATOU KEISUKE (JP)
YASUMURO CHIAKI (JP)
SHIMADA ATSUSHI (JP)

Application Number:

PCT/JP2014/072636

Publication Date:

May 07, 2015

Filing Date:

August 28, 2014

Export Citation:

Click for automatic bibliography generation Help

Assignee:

TOKYO ELECTRON LTD (JP)

International Classes:

C23C14/58; C23C14/14; C23C14/34; H01L43/08; H01L43/10

Domestic Patent References:

WO2012086183A1

2012-06-28

Foreign References:

JP2013249517A	2013-12-12
JPH05230640A	1993-09-07
JP2005042200A	2005-02-17
JPS6376868A	1988-04-07
JP2009065181A	2009-03-26

Other References: