Title:
DEPOSITION METHOD FOR CARBON-CONTAINING THIN FILM
Document Type and Number:
WIPO Patent Application WO/2021/025314
Kind Code:
A1
Abstract:
The present invention relates to a deposition method for a carbon-containing thin film. According to one embodiment, the deposition method for a carbon-containing thin film comprises a deposition cycle consisting of the steps of: inside a chamber loaded with a substrate, exposing the substrate to a precursor; purging the precursor from the chamber exposed to the precursor; inside the chamber from which the precursor has been purged, exposing the substrate to a reactive plasma; and purging the reactive plasma from the chamber exposed to the reactive plasma, wherein the deposition cycle is repeated a predetermined number of times, and by conducting a carbon-containing plasma treatment during the repeated cycles, a carbon-containing thin film of which carbon content is adjusted to a predetermined ratio is formed.
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Inventors:
JEON HYEONG TAG (KR)
JUNG CHAN WON (KR)
LEE NAM GUE (KR)
KIM BYUNG UK (KR)
SONG SEOK HWI (KR)
PARK SU HYEON (KR)
KWON YU RIM (KR)
JUNG CHAN WON (KR)
LEE NAM GUE (KR)
KIM BYUNG UK (KR)
SONG SEOK HWI (KR)
PARK SU HYEON (KR)
KWON YU RIM (KR)
Application Number:
PCT/KR2020/009251
Publication Date:
February 11, 2021
Filing Date:
July 14, 2020
Export Citation:
Assignee:
UNIV HANYANG IND UNIV COOP FOUND (KR)
International Classes:
H01L21/02; C23C16/26; C23C16/455
Foreign References:
| KR20160147143A | 2016-12-22 | |||
| KR20140037202A | 2014-03-26 | |||
| JP2002275630A | 2002-09-25 | |||
| KR20180091545A | 2018-08-16 | |||
| KR20180119133A | 2018-11-01 |
Attorney, Agent or Firm:
KIM, Youn Gwon (KR)
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