Title:
DEPOSITION PROCESSES USING GROUP 8 (VIII) METALLOCENE PRECURSORS
Document Type and Number:
WIPO Patent Application WO2004041753
Kind Code:
A9
Abstract:
Disclosed herein is a process for producing a film, coating or powder employing a metallocene or metallocene-like precursor having the general formula CpMCp', where M is a metal selected from the group consisting of Ru, Os and Fe; Cp is a first substituted cyclopentadienyl or cyclopentadienyl-like, e.g., indenyl, moiety that includes at least one substituent group D1, where D1 is X; Ca1Hb1Xc1; Ca2Hb2Xc2(C=0)Ca1Hb1Xc1; Ca2Hb2Xc2OCa1Hb1Xc1; Ca2Hb2Xc2(C=0)OCa1Hb1Xc1; or Ca2Hb2Xc2O(C=0)Ca1Hb1Xc1; and Cp' is a second substituted cyclopentadienyl or cyclopentadienyl-like, e.g., indenyl, moiety that includes at least one substituent group D1', where D1' is X; Ca1Hb1Xc1; Ca2Hb2Xc2(C=0)Ca1Hb1Xc1; Ca2Hb2Xc2OCa1Hb1Xc1; Ca2Hb2Xc2(C=0)OCa1Hb1Xc1; or Ca2Hb2Xc2O(C=0)Ca1Hb1Xc1. D1 and D1' are different from one another. X is a halogen atom or NO2; a1 is an integer between 1 to 8; b1 is an integer between 0 and 2(a1)+1-c1; c1 is an integer between 0 and 2(a1)+1 -b1; b1 + c1 is at least 1; a2 is an integer between 0 and 8; b2 is an integer between 0 and 2(a2) + 1 - c2; andc2 is an integer between 0 and 2(a2) + 1 - b2. The process can be used in manufacturing or processing electronic devices.
Inventors:
THOMPSON DAVID M (US)
HOOVER CYNTHIA A (US)
PECK JOHN D (US)
LITWIN MICHAEL M (US)
HOOVER CYNTHIA A (US)
PECK JOHN D (US)
LITWIN MICHAEL M (US)
Application Number:
PCT/US2003/034494
Publication Date:
November 25, 2004
Filing Date:
October 30, 2003
Export Citation:
Assignee:
PRAXAIR TECHNOLOGY INC (US)
THOMPSON DAVID M (US)
HOOVER CYNTHIA A (US)
PECK JOHN D (US)
LITWIN MICHAEL M (US)
THOMPSON DAVID M (US)
HOOVER CYNTHIA A (US)
PECK JOHN D (US)
LITWIN MICHAEL M (US)
International Classes:
C07F17/02; C23C16/18; C23C16/40; C23C16/455; (IPC1-7): C23C16/18
Download PDF: