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Patent Searching and Data


Title:
DEVICE FOR BLOCKING PLASMA BACKFLOW IN PROCESS CHAMBER TO PROTECT AIR INLET STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2021/134892
Kind Code:
A1
Abstract:
The present invention provides a device for blocking plasma backflow in a process chamber to protect an air inlet structure, comprising an air inlet nozzle tightly connected to an air inlet flange. The inner cavity of the air inlet nozzle is provided with an air inlet guide body, wherein the air inlet guide body has an upper structure, a middle structure, and a lower structure, the upper, middle, and lower structures are an integrated structure, the upper, middle, and lower structures are all cylindrical, the cross-sectional diameter of the upper structure is smaller than that of the middle structure, a gas gathering area is provided between the middle structure and the lower structure, and the middle structure and the lower structure are connected by the gas gathering area. The present invention has the beneficial effect of preventing damage to the air inlet guide body caused by ignition in the air inlet passage because the plasma flows back into the air inlet passage through an air inlet hole, and the air inlet passage is too close to a radio frequency power point.

Inventors:
LI NA (CN)
HU DONGDONG (CN)
LIU XIAOBO (CN)
LIU HAIYANG (CN)
CHENG SHIRAN (CN)
GUO SONG (CN)
WU ZHIHAO (CN)
XU KAIDONG (CN)
Application Number:
PCT/CN2020/077316
Publication Date:
July 08, 2021
Filing Date:
February 29, 2020
Export Citation:
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Assignee:
JIANGSU LEUVEN INSTR CO LTD (CN)
International Classes:
H01J37/32
Foreign References:
CN106711007A2017-05-24
CN107920411A2018-04-17
US20190295822A12019-09-26
US9050556B12015-06-09
Attorney, Agent or Firm:
NANJING JINGWEI PATENT & TRADEMARK AGENCY CO., LTD (CN)
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