Title:
DEVICE FOR MANUFACTURING SILICON FINE PARTICLES
Document Type and Number:
WIPO Patent Application WO/2020/026934
Kind Code:
A1
Abstract:
Provided is a device for manufacturing silicon fine particles, whereby a silicon raw material gas is uniformly preheated, and silicon fine particles can be stably generated. A device for manufacturing silicon fine particles, the device characterized by comprising a vertical cylindrical reactor having: at one end, a raw material gas introduction port for supplying a silicon raw material gas including trichlorosilane as a silicon source (Si source); in a body part, a preheating zone provided with a preheating mechanism for heating an inner wall thereof to a preheating temperature of the silicon raw material gas, and a reaction zone which adjoins the preheating zone and is provided with a heating mechanism for heating an inner wall thereof to a temperature equal to or higher than the decomposition temperature of the silicon raw material; and, in the other end, a fine particle outlet port for discharging a gas including silicon fine particles which is generated by thermal decomposition by the heating mechanism, an airflow agitation member having a shaft part and protruding parts, for example, being present in a body part space positioned in the preheating zone of the vertical cylindrical reactor.
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Inventors:
ARIYUKI MASAO (JP)
ISHIDA HARUYUKI (JP)
MOCHIZUKI NAOTO (JP)
ISHIDA HARUYUKI (JP)
MOCHIZUKI NAOTO (JP)
Application Number:
PCT/JP2019/029189
Publication Date:
February 06, 2020
Filing Date:
July 25, 2019
Export Citation:
Assignee:
TOKUYAMA CORP (JP)
International Classes:
C01B33/03; B01F23/10
Domestic Patent References:
| WO2005016820A1 | 2005-02-24 |
Foreign References:
| JP2008501603A | 2008-01-24 | |||
| JP2010030869A | 2010-02-12 |
Attorney, Agent or Firm:
SSINPAT PATENT FIRM (JP)
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