DEVICE AND METHOD FOR LARGE AREA LITHOGRAPHY

WIPO Patent Application WO2005054948

A3

Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114; 116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template.

HEIDARI BABAK (SE)
BECK MARC (SE)

PCT/EP2004/052769

April 13, 2006

November 03, 2004

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OBDUCAT AB (SE)
HEIDARI BABAK (SE)
BECK MARC (SE)

G03F7/00; G03F7/20; H05K3/00; H05K3/10; (IPC1-7): G03F7/00; G03F7/20

WO2001042858A1

2001-06-14

DE3643817A1	1988-06-30
US5947027A	1999-09-07
US4054383A	1977-10-18

COLBURN M ET AL: "STEP AND FLASH IMPRINT LITHOGRAPHY: A NEW APPROACH TO HIGH-RESOLUTION PATTERNING", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 3676, 15 March 1999 (1999-03-15), pages 379 - 389, XP008011830, ISSN: 0277-786X

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