Title:
DEVICE AND METHOD FOR PRODUCING AND SUPPLYING PERSULFURIC ACID SOLUTION
Document Type and Number:
WIPO Patent Application WO/2017/163851
Kind Code:
A1
Abstract:
A device and method for producing and supplying a persulfuric acid solution are provided, with which the time taken to replace the persulfuric acid solution in a semiconductor wafer cleaning device is shortened. While a persulfuric acid solution is being circulated and supplied to a cleaning tank 11 by a first electrolysis system 20, water and sulfuric acid are introduced into a storage tank 41 of a second electrolysis system, and circulated through a pump 44, a pipe 45, an electrolysis cell 50, a gas-liquid separator 52, and a pipe 53, to generate persulfuric acid. During the chemical change, the solution is drained from the first electrolysis system 20, and the persulfuric acid solution in storage tank 41 is subsequently transferred to storage tank 22.
Inventors:
OGAWA YUICHI (JP)
Application Number:
PCT/JP2017/008932
Publication Date:
September 28, 2017
Filing Date:
March 07, 2017
Export Citation:
Assignee:
KURITA WATER IND LTD (JP)
International Classes:
C25B15/08; C25B1/30; C25B9/18; H01L21/304
Domestic Patent References:
| WO2011155335A1 | 2011-12-15 |
Foreign References:
| JP2007051340A | 2007-03-01 | |||
| JP2007059603A | 2007-03-08 |
Attorney, Agent or Firm:
SHIGENO, Tsuyoshi et al. (JP)
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