Title:
DEVICE AND PROCESS FOR PREVENTING SUBSTRATE DAMAGES IN A DBD PLASMA INSTALLATION
Document Type and Number:
WIPO Patent Application WO/2014/009883
Kind Code:
A3
Abstract:
The present invention relates to a process for preventing substrate damages in an installation for surface treatment by dielectric barrier discharge (DBD) and a surface treatment DBD installation for carrying out such process. It comprises: - detecting the amplitude of the voltage at the terminals of the electrodes and the amplitude of the current circulating between said electrodes; - defining the maximum number of alternations of voltage at the terminals of the electrodes in the presence of a hot electric arc (n max) in order not to exceed 50 Joules as dissipated energy in said substrate; - when a hot electric arc appears between said electrodes, modifying with inverse feedback the voltage at the terminals of said electrodes before the defined maximum number of alternations of voltage at the terminals of the electrodes is reached.
Inventors:
TIXHON ERIC (BE)
LECLERCQ JOSEPH (BE)
MICHEL ERIC (BE)
LECLERCQ JOSEPH (BE)
MICHEL ERIC (BE)
Application Number:
PCT/IB2013/055636
Publication Date:
March 06, 2014
Filing Date:
July 09, 2013
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
International Classes:
H01J37/32
Domestic Patent References:
| WO2007129800A1 | 2007-11-15 |
Foreign References:
| EP2145701A1 | 2010-01-20 | |||
| DE102010024135A1 | 2011-12-22 | |||
| US20090159439A1 | 2009-06-25 | |||
| EP1073091A2 | 2001-01-31 | |||
| EP1870974A1 | 2007-12-26 | |||
| US20120060759A1 | 2012-03-15 |
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