DEVICE FOR RAPID VACUUM CONTROL

WIPO Patent Application WO2004092627

A3

The invention relates to a vacuum tank comprising integrated components, for example, linear and circular accelerators, cyclotrons, vacuum metallising systems, vacuum systems for soldering, welding, sintering, sputtering and drying, and vacuum systems for scientific experiments. The invention also relates to a method for operating said vacuum tank. The aim of the invention is to counter possible damage to the integrated components and to the vacuum system, caused by an ingress of air. To this end, the vacuum tank is divided into segments which are interconnected by means of valves. At least one sensor is located inside the vacuum tank, said sensor recording pressure changes inside the tank. If a gas inrush, i.e. a corresponding pressure change, is recorded, counter-measures can be introduced to avoid damage to the integrated components (e.g. closing valves). If a sensor records an increase in pressure caused by an ingress of air, the valves are closed. The corresponding segments are thus protected from the ingress of air, and the integrated components located in the segments cannot be regularly damaged by the ingress of air. The electricity can also be switched off.

KILIAN KURT (DE)
ABDEL-BARY MAMDOUH (DE)
DOLFUS NORBERT (DE)
SEFZICK THOMAS (DE)

PCT/DE2004/000695

January 13, 2005

April 03, 2004

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FORSCHUNGSZENTRUM JUELICH GMBH (DE)
KILIAN KURT (DE)
ABDEL-BARY MAMDOUH (DE)
DOLFUS NORBERT (DE)
SEFZICK THOMAS (DE)

G01M3/24; G01M3/32; (IPC1-7): G01M3/32; G01M3/24

US5526678A	1996-06-18
DE3711293A1	1988-10-27
US4424825A	1984-01-10
DE19906054A1	2000-08-31
US3675072A	1972-07-04
FR1327732A	1963-05-24

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