Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
DEVICE FOR SUBSTRATE TREATMENT BY MEANS OF LASER RADIATION
Document Type and Number:
WIPO Patent Application WO2003039803
Kind Code:
A3
Abstract:
A device, for substrate treatment by means of laser radiation, comprises a polygonal rotating mirror (16), by means of which at least one incident laser beam is reflected, which may be pivoted over an arrangement (24) of adjacent converging lenses, arranged at a separation from the substrate corresponding exactly or approximately to the focal length thereof. The polygonal rotating mirror is divided into at least two regions comprising facets and adjustable such that various regions (16', 16'') may be brought into the beam path of the laser radiation and correspondingly variable sweep or fanning angles for the laser beam reflected from the polygonal rotating mirror may be set.

Inventors:
PAUL HELMUT (DE)
HERRMANN WALTER (DE)
Application Number:
PCT/EP2002/010892
Publication Date:
November 27, 2003
Filing Date:
September 27, 2002
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
MLT MICRO LASER TECHNOLOGY GMB (DE)
PAUL HELMUT (DE)
HERRMANN WALTER (DE)
International Classes:
B23K26/067; B23K26/08; B23K26/082; B23K26/38; G02B5/09; G02B26/12; (IPC1-7): B23K26/067; B23K26/08; G02B26/12; B23K26/38
Foreign References:
DE2918283A11981-03-26
EP0549357A11993-06-30
US6292285B12001-09-18
Other References:
PATENT ABSTRACTS OF JAPAN vol. 014, no. 115 (C - 0696) 5 March 1990 (1990-03-05)
Download PDF: