Title:
DIAGNOSTIC DEVICE, DIAGNOSTIC METHOD, SEMICONDUCTOR MANUFACTURING DEVICE SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/148967
Kind Code:
A1
Abstract:
The present invention provides a technology enabling highly accurate diagnosis with few false positives and false negatives in the diagnosis of whether maintenance is required for a part to be diagnosed in a plasma processing device. Provided is a diagnostic device that separates sensor waveform data for respective plasma processes into components for each of a plurality of predefined types of sensor waveform variation, calculates, for each of the separated sensor waveform components, a degradation level indicating the state of degradation in a part on the basis of sensor waveform components in a normal state and at the time of diagnosis or sensor waveform components in a degraded state and at the time of diagnosis, and uses the degradation level at the time of diagnosis and a preset threshold to determine whether maintenance is required for the part. Furthermore, this diagnostic device filters time series data of the degradation level calculated for each of the plasma processes and sets the threshold to be used for degradation determination with respect to each plasma processing device on the basis of a distribution calculated using a plurality of filtered degradation levels in a learning interval from a time of part maintenance to a time after a prescribed number of processes.
Inventors:
UMEDA SHOTA (JP)
SUMIYA MASAHIRO (JP)
ASAKURA RYOJI (JP)
SUMIYA MASAHIRO (JP)
ASAKURA RYOJI (JP)
Application Number:
PCT/JP2022/004679
Publication Date:
August 10, 2023
Filing Date:
February 07, 2022
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01L21/02; G05B23/02; H01L21/66
Domestic Patent References:
| WO2018061842A1 | 2018-04-05 | |||
| WO2020152889A1 | 2020-07-30 |
Foreign References:
| JP2012009064A | 2012-01-12 | |||
| JP2010283000A | 2010-12-16 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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